ASML Holding N.V.
Hieronder vindt u informatie uit het register openbaarmaking voorwetenschap. Deze informatie is door de organisatie verstrekt.
Publicatie datum
22 feb 2016 - 17:35
Statutaire naam
ASML Holding N.V.
Titel
ASML partners with Nippon Control System to streamline process flow from design to mask production
Bericht
San Jose, California, 22 February 2016 - ASML Holding NV (ASML) today announced a partnership with Nippon Control System Corporation (NCS) to integrate their products from optical proximity correction (OPC) to mask data preparation (MDP) on a common platform, delivering improvements in mask tape-out productivity and patterning performance in wafer fabrication. Semiconductor manufacturers will now be able to deploy ASML's computational lithography products and NCS' MDP products into a seamless process flow for a faster and more accurate design to mask (D2M) solution.
The collaboration addresses the challenges customers are facing in mask tape-out and wafer patterning driven by growing mask complexity with shrinking process nodes in both multiple patterning and EUV applications. Specific integration examples and benefits include:
A complete MDP flow to identify and improve mask accuracy required for pattern fidelity, critical dimension uniformity (CDU) and overlay performance;
A seamless processing and handling of large volumes of data between OPC and MDP operations to reduce cycle time and optimize productivity, while maximizing utilization of available computing resources.
Gerelateerde downloads
Datum laatste update: 21 december 2025