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ASM International N.V.

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  • Publicatie datum 10 jul 2012 - 21:26
  • Statutaire naam ASM International N.V.
  • Titel ASM International N.V. introduces New High Productivity Epitaxy, PEALD and PECVD Systems
  • Bericht ALMERE, The Netherlands - July 10, 2012 - ASM International N.V. (NASDAQ: ASMI and Euronext Exchange in Amsterdam: ASM), today launched two new advanced deposition systems. The new systems deliver industry-leading process performance for epitaxy, plasma enhanced atomic layer deposition (PEALD) and plasma enhanced chemical vapor deposition (PECVD), targeting 300 mm high volume manufacturing (HVM). First, the company introduced the Intrepid(TM) XP, a single wafer Epi process tool that can be configured with up to four epitaxy reactor modules. The Intrepid(TM) XP deposits advanced strained silicon based Epi films that are used to lower power consumption in CMOS transistors at 20nm and beyond.

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201207100000000032_New high Productivity Expitaxy, PEALD and PECVD Systems .pdf

Datum laatste update: 17 april 2021

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